Method of cleaning a reactor

C - Chemistry – Metallurgy – 23 – G

Patent

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148/27

C23G 5/00 (2006.01) C23C 16/44 (2006.01) C30B 25/08 (2006.01)

Patent

CA 1143259

1.8.1980 ABSTRACT: Method of cleaning a reactor. A method of cleaning a reactor after at least one layer has been provided therein from a gaseous phase on substrates and the substrates have been removed from the reactor, characterized in that the cleaning is carried out with a gaseous phase containing dry hydrogen fluoride.

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