C - Chemistry – Metallurgy – 23 – G
Patent
C - Chemistry, Metallurgy
23
G
148/27
C23G 5/00 (2006.01) C23C 16/44 (2006.01) C30B 25/08 (2006.01)
Patent
CA 1143259
1.8.1980 ABSTRACT: Method of cleaning a reactor. A method of cleaning a reactor after at least one layer has been provided therein from a gaseous phase on substrates and the substrates have been removed from the reactor, characterized in that the cleaning is carried out with a gaseous phase containing dry hydrogen fluoride.
360274
N.v. Philips Gloeilampenfabrieken
Van Steinburg C.e.
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