Method of coating oxidized inorganic substrates with polymide

Details Method of coating oxidized inorganic substrates with polymide Method of coating oxidized inorganic substrates with polymide

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Patent

CA 1040942

METHOD OF COATING OXIDIZED INORGANIC SUBSTRATES WITH POLYIMIDE Abstract of the Disclosure Substrates with oxidized surfaces, as e.g. SiO2 layers on silicon semiconductors and aluminum surfaces, are wetted with an organic silicon compound in an organic solvent. The solvent is then removed in a dry atmosphere. Subsequently, a coating is applied from a solution of a polyamido carbon acid formed of pyromellitic acid anhydride and an aromatic amino component and the polyamido carbon acid is heated to form an adherent layer of polyimide.

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