Method of controlling manganese deposition in open...

Details Method of controlling manganese deposition in open... Method of controlling manganese deposition in open...

C - Chemistry, Metallurgy

02

F

134/39

C02F 5/14 (2006.01)

Patent

CA 1321341

Abstract of Disclosure A method of inhibiting manganese deposition in open, recirculating aqueous systems is disclosed. A water soluble acrylic acid/allyl hydroxy propyl sulfonate ether copolymer having repeat units characterized by the structural formula: Image wherein M is a water soluble cation, the molar ratio x:y is from about 3:1 to about 6:1 and the number average molecular weight of the copolymer is from about 5,000 to about 10,000, preferrably with an organic phosphonate is added to the aqueous system. The organic phosphonate is preferrably hydroxy ethylidene diphosphonic acid, diethylene triamine penta-(methylene phosphonic acid) or blends thereof. The copolymer or copolymer and phosphonic acid is effective in inhibiting the deposition of manganese in aqueous systems.

606976

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