Method of converting a positive photoresist layer to a...

G - Physics – 03 – C

Patent

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96/216, 96/252

G03C 5/00 (2006.01)

Patent

CA 1075523

METHOD OF CONVERTING A POSITIVE PHOTORESIST LAYER TO A NEGATIVE PHOTORESIST IMAGE Abstract of the Disclosure A normally positive acting photoresist material is made operable as a negative acting material by the additional steps following image-wise exposure, of heating the layer and subsequently blanket exposing it to light prior to developing it with an alkaline solvent.

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