C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/96.01
C23C 16/24 (2006.01) C23C 16/452 (2006.01) C23C 16/455 (2006.01) C23C 16/44 (2006.01)
Patent
CA 1339914
A method of forming a high flux of activated species (34), such as ions, of an energy transferring gas (A) by employing a substantial pressure differential between the pressure adjacent the aperture (26) in a first conduit (24) through which the energy transferring gas is introduced into a vacuumized enclosure (12) and the background pressure which exists in said enclosure. In one embodiment, the flow rate of the energy transferring gas flowing through said first conduit, when taken in conjunction with said pressure differential, causes the high flux of activated species of the energy transferring gas to collide with a precursor deposition/etchant gas, remotely introduced into the enclosure through a second conduit (60), for forming deposition/etchant species (65) therefrom. In an alternate embodiment, the pressure differential causes those activated species, themselves, to be either deposited upon or etched away from the surface of a remotely ppsitioned substrate (50).
596489
Doehler Joachim
Dotter Buddie II
Hudgens Stephen
Krisko Annette
Krisko Jeffrey M.
Energy Conversion Devices Inc.
Macrae & Co.
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