Method of creating a solvent-free polymeric...

C - Chemistry – Metallurgy – 08 – G

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C08G 77/26 (2006.01) A01N 55/00 (2006.01) C09D 183/06 (2006.01)

Patent

CA 2601594

An antimicrobial polymer is disclosed containing silicon-containing quaternary ammonium groups, the polymer including in its structure repeating units of Formula II: R3N+R~nSiX'4-nY - (II) wherein each R and each R0 is independently a non-hydrolysable organic group; each X' is -OR', -OH or -O-Si, wherein R' is an alkyl group of 1 to about 22 carbon atoms, or an aryl group of 6 carbon atoms; n is an integer of O to 3; and Y is an anionic moiety suitable to form the salt of the repeating units of Formula II. Also disclosed are methods of making such a polymer and imparting sustained antimicrobial properties to a substrate using the polymer.

L'invention concerne un polymère antimicrobien contenant des groupes d'ammonium quaternaire contenant du silicium, le polymère comprenant dans sa structure des motifs répétés de formule II : R3N+R°nSiX'4-nY -, dans laquelle chaque R et chaque R0 représente indépendamment un groupe organique non hydrolysable ; chaque X' représente -OR', -OH ou -O-Si, R' représentant un groupe alkyle de 1 à environ 22 atomes de carbone, ou un groupe aryle de 6 atomes de carbone ; n représentant un entier compris entre O et 3 ; et Y représentant une fraction anionique appropriée pour former le sel des unités répétées de formule II. L'invention concerne également des procédés permettant de préparer ledit polymère et de conférer des propriétés antimicrobiennes prolongées à un substrat à l'aide dudit polymère.

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