Method of depositing chromium and silicon on a metal to form...

Details Method of depositing chromium and silicon on a metal to form... Method of depositing chromium and silicon on a metal to form...

C - Chemistry, Metallurgy

23

C

C23C 8/72 (2006.01)

Patent

CA 2169146

A method for the simultaneous deposition of chromium and silicon to form a diffusion coating on a workpiece uses a halide-activated cementation pack with a dual halide activator. Elemental metal powders may be employed with the dual activator. A two-step heating schedule prevents blocking a chromium carbide from forming at the surface of the workpiece. Small contents of either Ce or V can be added to the Cr + Si contents of the coating by introducing oxides of Ce or V into the filler of the pack.

Affiliated with

Also associated with

Rating

Method of depositing chromium and silicon on a metal to form... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of depositing chromium and silicon on a metal to form..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of depositing chromium and silicon on a metal to form... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1678479