Method of depositing optical oxide coatings at enhanced rates

Details Method of depositing optical oxide coatings at enhanced rates Method of depositing optical oxide coatings at enhanced rates

C - Chemistry, Metallurgy

23

C

C23C 14/34 (2006.01) C23C 14/00 (2006.01) C23C 14/08 (2006.01)

Patent

CA 2059525

2059525 9102103 PCTABS00003 A sputtering method is provided in which a substantially transparent target oxide film with predetermined optical properties is prepared having substantially the same degree of absorption per unit thickness as were the process practiced with pure oxygen gas as sole reactant, yet with a rate that is enhanced with respect to the method when oxygen gas is sole reactant. In practicing the inventive method, a target substrate is sputtered in a chamber while providing a source of reactive oxygen. The source of reactive oxygen has a reactivity in forming target oxide that is enhanced with respect to pure oxygen gas and includes nitrous oxide. Target oxide deposited on the substrate has an absorption per unit thickness that is substantially the same absorption per unit thickness as when pure oxygen gas is sole reactant. The deposition rate is preferably controlled by a value derived from plasma emission lines of oxygen atoms and target atoms.

Affiliated with

Also associated with

Rating

Method of depositing optical oxide coatings at enhanced rates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of depositing optical oxide coatings at enhanced rates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of depositing optical oxide coatings at enhanced rates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-2016621