G - Physics – 03 – C
Patent
G - Physics
03
C
96/218
G03C 5/00 (2006.01) G03F 1/08 (2006.01) G03F 7/16 (2006.01) G03F 7/20 (2006.01) G03F 7/42 (2006.01) H05K 3/06 (2006.01)
Patent
CA 1156505
This invention concerns a manufacturing process with which it is possible to manufacture reticles directly by means of a pattern generator without using an emulsion plate. In the direct process, a substrate comprising a glass plate coated with a chrome layer is coated with a positive-type photosensitive resist layer of a thickness resonant to the wavelength utilized by said pattern genera- tor, and then exposed and developed according to the re- quired configuration in a high intensity pattern generator. The chrome is plasma-etched and, finally, the resist is re- moved to produce a reticle with the desired pattern. In order to obtain a reversed contrast pattern, the substrate, after developing, is coated with a thin metal layer, such as aluminum, and then the resist is lifted off together with the metal. The exposed chrome, in its turn, is re- moved. The metal can, in its turn, be optionally etched. The reticles are utilized to manufacture masks which are involved in the photoligraphic steps of integrated circuits.
352379
Descamps Denis
Guermont Daniel
Piaczinski Zbigniew
Sautereau Jacques
International Business Machines Corporation
Rosen Arnold
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