Method of etching and polishing a surface of a substrate...

Details Method of etching and polishing a surface of a substrate... Method of etching and polishing a surface of a substrate...

C - Chemistry, Metallurgy

23

F

149/12, 149/21

C23F 1/00 (2006.01) C04B 41/53 (2006.01) C04B 41/91 (2006.01)

Patent

CA 1042772

A METHOD OF ETCHING A SURFACE OF A SUBSTRATE COMPRISING LiTaO3 AND CHEMICALLY SIMILAR MATERIALS Abstract of the Disclosure A method of etching a surface of a substrate comprising lithium tantalate (LiTaO3) and chemically similar materials is disclosed. The method includes contacting the surface with a mixture comprising hydrofluoric acid and sulfuric acid. In addition to its etching action, the mixture is also capable of polishing the thus treated surface. -i-

209655

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