C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/251
C08F 2/50 (2006.01) G03F 7/00 (2006.01) G03F 7/20 (2006.01)
Patent
CA 1271078
ABSTRACT OF THE DISCLOSURE In general and in one preferred method, a diaphragm plate may be formed by providing a vessel containing a quantity of a light-transmittive first photopolymer compound which includes, as mixed constituents, a reactive oligomer resin, a reactive monomer diluent and a photoinitiator. A first unmarked surface of the compound is irradiated with ultraviolet (UV) light for solidifying the suraface to a depth equal to the relief thickness, i.e., the desired diaphragm thickness. A second surface of the compound is irradiated with UV light subsequent to being covered with an opaque mask which defines the shape of the diaphragm. This irradiation completes the formation of the diaphragm plate by solidifying the remaining, unmasked quantity of compound. The unsolidified compound is then removed from the masked area of the plate. Other preferred methods are also disclosed.
477786
Colla Jeannine O.
Fudim Efrem V.
Colla Jeannine O.
Fudim Efrem V.
Johnson Service Company
Kirby Eades Gale Baker
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