Method of fabricating optical nonlinear thin film waveguide...

G - Physics – 02 – F

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G02F 1/01 (2006.01) G02F 1/355 (2006.01) G02F 1/365 (2006.01)

Patent

CA 2321744

A Ge-added SiO2 thin film (12) is formed on a glass substrate (10), and a metal film (14) is formed thereon (S11 to S13). By etching the metal film (14), a pair of electrodes (14a, 14b) mutually opposed at a predetermined interval is formed (S14). An insulating thin film (16) is formed on the insulating film (12) and the electrodes (14a, 14b) (S15). While applying ultraviolet radiation, a high voltage is applied between the electrodes (14a, 14b) to perform ultraviolet excitement polling to impart an optical nonlinearity to a channel region (18) (S16). By controlling the voltage application to the channel region (18) having the optical nonlinearity, the light transmitted through the channel region (18) is controlled. Thus, an optical nonlinear waveguide for propagating single mode light is formed on a glass substrate.

On forme une couche mince de SiO¿2? à ajout de Ge (12) sur un substrat de verre (10), avant de former également une couche métallique (14) sur cette couche mince (S11 à S13). On soumet ensuite ladite couche métallique (14) à une attaque chimique, de manière à former (S14) deux électrodes (14a, 14b) séparées l'une de l'autre par un espace prédéterminé. Puis on forme (S15) une couche mince isolante (16) sur la couche isolante (12) et sur les électrodes (14a, 14b). Un rayonnement ultraviolet et une tension élevée sont ensuite appliqués (S16) entre lesdites électrodes (14a, 14b), de manière à produire (S16) une polarisation d'excitation aux ultraviolets destinée à conférer une non-linéarité optique à une zone du canal (18). On module ensuite la lumière transmise à travers cette zone du canal (18) en régulant la tension appliquée sur cette zone (18), ce qui permet de former sur un substrat de verre un guide d'ondes optique non linéaire destiné à propager une lumière monomode.

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