G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 1/00 (2006.01) B41M 3/00 (2006.01) B41M 7/00 (2006.01) G03F 7/16 (2006.01) H05K 3/00 (2006.01) H05K 3/12 (2006.01) H05K 3/40 (2006.01)
Patent
CA 2375365
A method of forming a masking pattern on a surface using the technique of droplet ejection to deposit droplets of deposition material, said method comprising depositing a plurality of droplets on said surface to form such a pattern comprising multiple discrete or coalesced extended portions.
L'invention porte sur un procédé de formation d'un motif de masquage sur une surface par éjection de gouttelettes se déposant sur le matériau de dépôt. Ledit procédé consiste à déposer des séries de gouttelettes sur ladite surface pour y former le motif comprenant de nombreuses portions discrètes ou coalescentes.
Bresler Eric
Gardner Ian Andrew
Speakman Stuart
Fetherstonhaugh & Co.
Jetmask Limited
Patterning Technologies Limited
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