Method of forming a nitride layer

Details Method of forming a nitride layer Method of forming a nitride layer

C - Chemistry, Metallurgy

23

C

148/36.2

C23C 16/34 (2006.01) C23C 16/36 (2006.01) C23C 16/442 (2006.01) C23C 16/448 (2006.01)

Patent

CA 1238558

9444-18 ABSTRACT OF THE DISCLOSURE A method of forming a layer of a nitride or carbonitride of titanium, vanadium or the like on the surface of an article to be treated includes disposing a treating material composed of refractory powder, powder of a metal or alloy of a nitride forming element and a halide powder, and the article to be treated in a fluidized bed furnace, ancl introducing a nitrogen-containing gas into the furnace under heated conditions to fluidize the treating material, thereby effecting the surface treatment. This method provides a nitride or carbonitride layer having a smooth surface and a uni- form thickness rapidly and safely without using hydrogen and a halogen vapor. The method is much safer than that of prior art. TC6011-2

482532

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