Method of forming a photoresist element

Details Method of forming a photoresist element Method of forming a photoresist element

G - Physics

03

C

G03C 1/76 (2006.01)

Patent

CA 2605579

A method of forming a photoresist element comprising the steps of: preparing a hot melt photoresist mixture; applying the photoimageable hot melt composition to a film substrate using a slot die coating system; cooling the hot melt sufficiently to prevent flow; and applying a protective cover film to the opposite surface of the partially cooled composition, thereby forming a photoresist element.

Procédé d'obtention d'un élément photorésistant comprenant les opérations suivantes: préparation d'un mélange fondu chaud photorésistant; application de la composition fondue chaude photoimageable sur un substrat de film selon un système d'application à filière plate; refroidissement suffisant de la composition fondue chaude pour l'empêcher de couler; et application d'un film protecteur de couverture sur la surface de la composition partiellement refroidie, ce qui permet d'obtenir un élément photorésistant.

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