Method of forming a plasma sprayed interconnection layer on...

H - Electricity – 01 – M

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H01M 4/86 (2006.01) C23C 4/06 (2006.01) C23C 4/18 (2006.01) H01M 4/88 (2006.01) H01M 8/02 (2006.01) H01M 8/12 (2006.01)

Patent

CA 2142408

A dense, substantially gas-tight, electrically conductive interconnection layer is formed on an air electrode structure of an electrochemical cell by (A) providing an electrode surface; (B) forming on a selected portion of the electrode surface, a layer of doped LaCrO3 particles doped with an element selected from Ca, Sr, Ba, Mg, Co, Ni, Al and mixtures thereof by plasma spraying doped LaCrO3 powder, preferably compensated with chromium as Cr2O3 and/or dopant element, preferably by plasma arc spraying; and, (C) heating the doped and compensated LaCrO3 layer to about 1100°C to 1300°C to provide a dense, substantially gas-tight, substantially hydration-free, electrically conductive interconnection material bonded to the electrode surface. A solid electrolyte layer can be applied to the unselected portion of the air electrode, and a fuel electrode can be applied to the solid electrolyte, to provide an electrochemical cell.

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