C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/1
C25D 3/50 (2006.01) C25D 5/28 (2006.01) C25D 5/50 (2006.01) G01R 31/12 (2006.01)
Patent
CA 1146112
Abstract of the Disclosure A method of platinizing and heat treating tantalum metal is described. The platinizing of tantalum is accomplished by placing a piece of conductive corrosion resistant metal and a tantalum workpiece as electrodes in a platinizing solution. The electrodes are connected to a source of DC power supply and when the current is passed, platinum black is deposited on the tantalum work- piece. The platinized tantalum workpiece is then placed in a furnace maintained at a temperature of about 1050 to 1150°C for a time sufficient to diffuse the coated platinum into the surface of the tantalum core.
331382
Macrae & Co.
Pfaudler Co. Inc. (the)
LandOfFree
Method of forming a platinum layer on tantalum does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of forming a platinum layer on tantalum, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a platinum layer on tantalum will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1018444