Method of forming a platinum layer on tantalum

C - Chemistry – Metallurgy – 25 – D

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204/1

C25D 3/50 (2006.01) C25D 5/28 (2006.01) C25D 5/50 (2006.01) G01R 31/12 (2006.01)

Patent

CA 1146112

Abstract of the Disclosure A method of platinizing and heat treating tantalum metal is described. The platinizing of tantalum is accomplished by placing a piece of conductive corrosion resistant metal and a tantalum workpiece as electrodes in a platinizing solution. The electrodes are connected to a source of DC power supply and when the current is passed, platinum black is deposited on the tantalum work- piece. The platinized tantalum workpiece is then placed in a furnace maintained at a temperature of about 1050 to 1150°C for a time sufficient to diffuse the coated platinum into the surface of the tantalum core.

331382

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