Method of forming adherent fluorosilane layer on a substrate...

Details Method of forming adherent fluorosilane layer on a substrate... Method of forming adherent fluorosilane layer on a substrate...

C - Chemistry, Metallurgy

08

J

117/143, 117/187

C08J 7/04 (2006.01) B41J 2/01 (2006.01) B41J 2/16 (2006.01) C09D 183/04 (2006.01) C09D 183/08 (2006.01)

Patent

CA 1329341

METHOD OF FORMING ADHERENT FLUOROSILANE LAYER ON A SUBSTRATE AND INK JET RECORDING HEAD CONTAINING SUCH A LAYER ABSTRACT A method of reducing the wettability of non-vitreous surfaces, and ink jet recording heads including a surface having reduced wettability, are provided wherein a layer of cured siloxane is formed on the non-vitreous surface and a layer derived from at least one fluorosilane is formed on the siloxane layer.

613869

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