Method of forming amorphous polymeric halosilane films and...

Details Method of forming amorphous polymeric halosilane films and... Method of forming amorphous polymeric halosilane films and...

B - Operations, Transporting

05

D

42/2, 117/86, 20

B05D 5/12 (2006.01) C23C 16/24 (2006.01) H01L 21/205 (2006.01)

Patent

CA 1245109

METHOD OF FORMING AMORPHOUS POLYMERIC HALOSILANE FILMS AND PRODUCTS PRODUCED THEREFROM ABSTRACT There is described herein a method of forming amorphous polymeric halosilane films by decomposition on a substrate of bromo-, chloro-, fluoro-, di- or polysilanes at a temperature of between about 250°C and 550°C. As an example, hexafluorodisilane was decomposed at 350°C. for 45 minutes and formed a gold lightly reflective film on a glass substrate. The films so formed may have application as solar cells, thin film transistors, optical data storage media and scratch resistant coatings.

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