Method of forming an indium-containing transparent...

Details Method of forming an indium-containing transparent... Method of forming an indium-containing transparent...

C - Chemistry, Metallurgy

23

C

C23C 14/34 (2006.01) C23C 14/08 (2006.01) H01L 31/18 (2006.01)

Patent

CA 2740363

A method of forming an indium-containing transparent conductive oxide by reactive sputtering a metal target containing indium in an oxygen containing atmosphere and then depositing the resulting indium oxide on a substrate. Metal targets used in the method and photovoltaic devices utilizing the transparent conductive oxides are also disclosed.

L'invention porte sur un procédé de fabrication d'un oxyde conducteur, transparent, contenant de l'indium par la pulvérisation cathodique réactive d'une cible métallique contenant de l'indium dans une atmosphère contenant de l'oxygène, puis par le dépôt de l'oxyde d'indium résultant sur un substrat. Des cibles métalliques utilisées dans le procédé et des dispositifs photovoltaïques utilisant les oxydes conducteurs transparents sont également décrits.

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