Method of forming and growing a single crystal of a...

C - Chemistry – Metallurgy – 30 – B

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C30B 25/00 (2006.01) C30B 11/06 (2006.01) C30B 11/14 (2006.01) C30B 29/44 (2006.01)

Patent

CA 1080588

A METHOD OF FORMING AND GROWING A SINGLE CRYSTAL OF A SEMICONDUCTOR COMPOUND Abstract of the Disclosure A method of forming and growing a single crystal of a semiconductor compound comprising a Group II-VI or Group III-V compound is disclosed. The method comprises placing a single crystal seed of the semiconductor compound adja- cent to a first reactant comprising a Group II or Group III element. A protective blanket, resulting from at least a second reactant of a Group VI or Group V element, is formed over the seed within a temperature zone to protect the seed from dissolution by the first reactant. The reactants are combined to form a melt at a first temperature within the temperature zone and to grow a single crystal from the melt on the seed at a second temperature within the temperature zone. The single crystal thus produced can be used, for example, as a substrate for luminescent diodes, transistors, diodes and the like.

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