Method of forming dielectric thin film pattern and method of...

Details Method of forming dielectric thin film pattern and method of... Method of forming dielectric thin film pattern and method of...

H - Electricity

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L

H01L 21/203 (2006.01) H01L 21/02 (2006.01) H01L 21/027 (2006.01) H01L 21/316 (2006.01) H05K 1/02 (2006.01) H05K 3/04 (2006.01)

Patent

CA 2290764

A method of forming a dielectric thin film pattern, comprises the steps of: depositing a dielectric thin film on a substrate having a resist pattern thereon by a vapor deposition method, wherein as a material for the dielectric thin film, at least one of CeO2, Sm2O3, Dy2O3, Y2O3, TiO2, Al2O3 and MgO is used; and removing the resist pattern whereby the dielectric thin film is patterned.

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