C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
C09D 183/00 (2006.01) B05D 7/24 (2006.01) C09D 1/00 (2006.01) C09D 5/00 (2006.01) C09D 183/02 (2006.01)
Patent
CA 2293356
The present invention provides a process for forming a hydrophilic inorganic coated film on a surface of a base material, the process comprising the steps of: (1) preparing an inorganic coating composition which contains, as a major component, a silicone resin obtained by hydrolyzing and condensation-polymerizing only the tetra- functional alkoxysilane represented by the formula: Si(OR)4 [wherein R represents an alkyl group having 1 to 7 carbon atoms or an aryl group], and has a total solid content of not more than 5% by weight; (2) applying the inorganic coating composition to a surface of the base material to form a coated layer; and (3) drying and curing the coated layer to form a cured coated film having a thickness of 0.01 to 0.5µm. The hydrophilic inorganic coated film formed by the process of the present invention is highly hydrophilic just after the film is formed, even in the case where it is not irradiated with ultraviolet rays.
Procédé permettant de former un film de revêtement inorganique hydrophile à la surface d'un substrat, qui comprend les étapes suivantes: 1) on produit une composition de revêtement inorganique, qui renferme comme principal composant une résine de silicone que l'on obtient en soumettant uniquement un alcoxysilane tétrafonctionnel, représenté par la formule Si(OR)4, (dans laquelle R est alkyle renfermant jusqu'à 7 atomes de carbone ou aryle), à une polycondensation hydrolytique, et qui a une teneur en matières solides totales inférieure ou égale à 5 % en poids; 2) on applique la composition de revêtement inorganique à la surface du substrat de façon à former une couche de revêtement; et 3) on sèche et on durcit la couche de revêtement de façon à former un film durci ayant une épaisseur comprise entre 0,01 et 0,5 mu m. La surface du film de revêtement inorganique hydrophile ainsi formée est extrêmement hydrophile, même juste après la formation du film et même si celui-ci est moins apte à être irradié par les ultraviolets.
Ikenaga Junko
Inoue Minoru
Nakamoto Shoichi
Takahama Koichi
Kirby Eades Gale Baker
Matsushita Electric Works Ltd.
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