Method of forming si-o containing coatings

B - Operations – Transporting – 05 – D

Patent

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B05D 3/04 (2006.01) H01L 21/3105 (2006.01) H01L 21/316 (2006.01)

Patent

CA 2117593

Disclosed is a method for forming improved Si-O containing coatings on electronic substrates. The method comprises treating Si-O containing ceramic coatings derived from hydrogen silsesquioxane resin with hydrogen gas. The resultant coatings have improved properties such as stable dielectric constants.

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