Method of making a pattern

Details Method of making a pattern Method of making a pattern

C - Chemistry, Metallurgy

08

G

356/12, 402/38

C08G 2/22 (2006.01) G03F 7/038 (2006.01) G03F 7/16 (2006.01) H05K 3/28 (2006.01)

Patent

CA 2003933

K-17339/=/AR1 393 A Method of Making a Pattern ABSTRACT OF THE DISCLOSURE A method of making a pattern of an electrically conductive material which comprises (i) electrodepositing on an electrically conductive surface a film comprising a photocurable organic resin, (ii) forming on the electrodeposited film a predetermined pattern of a resist co-cured with underlying areas of the electro- deposited film by exposure to actinic radiation, thereby leaving predetermined areas of the electrodeposited film uncovered, and (iii) removing the uncovered areas of the electrodeposited film by treatment with a solvent therefor, thereby forming a surface comprising bare conductive material in predetermined areas and, in other predetermined areas, photocured resist securely bonded to the electrically conductive surface through the cured areas of the electrodeposited film covered by the resist. The method is useful in the production of printed circuits.

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