Method of making an embossed pattern on an information...

Details Method of making an embossed pattern on an information... Method of making an embossed pattern on an information...

G - Physics

03

C

96/191, 96/250,

G03C 1/00 (2006.01) G03C 5/00 (2006.01) G03F 1/00 (2006.01) G11B 7/0045 (2006.01) G11B 7/243 (2006.01) G11B 7/26 (2006.01)

Patent

CA 1036859

Abstract of the Disclosure An improved process for forming an embossed pattern through the use of a writting concentrated beam opening holes in a film capable of undergoing residue free evapora- tion. A layer of photoresist is overlayed with the film and upon being exposed and processed the layer supplies the pros- pective embossed pattern.

190410

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