Method of making charge rings

Details Method of making charge rings Method of making charge rings

C - Chemistry, Metallurgy

23

C

204/96.06

C23C 15/00 (1980.01)

Patent

CA 1120889

BF&N Docket 6569 METHOD OF MAKING CHARGE RINGS ABSTRACT OF THE DISCLOSURE An improved process for the deposition of metal layers on the surfaces of orifices in non-conductive charge ring plate substrates which employs a continuously varying sputtering technique. Oxides of titanium are first deposited on the substrate. The process is then continually adjusted to decrease the oxygen content of the blend layer being deposited until a pure titanium layer has been deposited. Then, a second blend layer of titanium and gold is deposited, again continually adjust- ing the process so that the gold to titanium ratio of the blend layer increases until a layer of pure gold is de- posited. The adherence characteristics of the layers are greatly improved resulting in a more durable charge ring structure.

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