G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/00 (2006.01)
Patent
CA 2336467
Optical structures are replicated in photoresist on a substrate using a stamp. The transfer of the pattern into the liquid photoresist and the provision on the substrate can be achieved using manual pressures. Various techniques may be used to remove air from the liquid photoresist. The stamp is removed once the liquid photoresist is fully solidified. These structures in solidified photoresist may serve as optical elements or may be accurately transferred into the substrate. The stamp may be for an entire wafer.
L'invention concerne la réplique de structures optiques dans une photorésine sur un substrat grâce à une matrice de pressage. On peut effectuer le transfert du motif dans la photorésine liquide et sur le substrat par une pression manuelle. On peut utiliser plusieurs techniques pour éliminer l'air de la photorésine liquide. On retire la matrice de pressage dès que la photorésine liquide est totalement solidifiée. Ces structures dans de la photorésine solidifiée peuvent servir d'éléments optiques ou peuvent être transférées avec précision dans le substrat. La matrice de pressage peut servir pour une tranche entière.
Feldman Michael R.
Harden Brian
Suleski Thomas J.
Borden Ladner Gervais Llp
Digital Optics Corporation
Digitaloptics Corporation East
LandOfFree
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