Method of making planarizing non-conductive layers employing...

Details Method of making planarizing non-conductive layers employing... Method of making planarizing non-conductive layers employing...

H - Electricity

01

L

96/215, 117/61

H01L 21/443 (2006.01) C23C 14/24 (2006.01) H01L 39/22 (2006.01) H01L 39/24 (2006.01)

Patent

CA 1210984

ABSTRACT OF THE DISCLOSURE During the manufacture of Josephson junction devices, it is necessary to provide superconducting layers for electrodes. During the manufacture of semiconductors, it is necessary to provide conductive paths and leads. A layer of conducting metal or superconducting metal may be vacuum deposited in such a manner that any predetermined pattern or shape of normally conducting metal is made transversely non-conducting. The layer metal which is transversely non-conductive is vacuum deposited in the presence of an inert gas at a pressure which is high enough to cause the evaporated and deposited metal to form islands of conductive metal separated by insulating voids to provide gross electrical anisotropy.

435758

Affiliated with

Also associated with

Rating

Method of making planarizing non-conductive layers employing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making planarizing non-conductive layers employing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making planarizing non-conductive layers employing... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1336404