Method of making x-ray masks

Details Method of making x-ray masks Method of making x-ray masks

G - Physics

03

F

149/10

G03F 5/00 (2006.01) G03F 1/00 (2006.01) H01L 21/30 (2006.01)

Patent

CA 1141274

PATENT APPLICATION PAPERS OF Martin J. Casey FOR: METHOD OF MAKING X-RAY MASKS ABSTRACT OF THE DISCLOSURE An x-ray mask is made by forming a thin polyimide membrane on a silicon wafer substrate which is then back- etched to form a mask supporting ring of the substrate.

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