Method of manufacturing a composite material with lamellar...

C - Chemistry – Metallurgy – 04 – B

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C04B 35/80 (2006.01) C04B 35/565 (2006.01)

Patent

CA 2171535

The interphase is formed by nanometric scale sequencing of a plurality of different constituents including at least a first constituent that intrinsically presents a lamellar microtexture, and at least a second constituent that is suitable for protecting the first against oxidation. A plurality of elementary layers of a first constituent of lamellar microtexture, e.g. selected from pryolytic carbon, boron nitride, and BC3 are formed in alternation with one or more elementary layers of a second constituent having a function of providing protection against oxidation and selected, for example, from SiC, Si3N4, SiB4, SiB6, and a codeposit of the elements Si, B, and C. The elementary layers of the interphase are preferably less than 10 nanometers thick and they are formed by chemical vapor infiltration or deposition in pulsed form.

L'interphase est formée par un séquençage à l'échelle nanométrique de plusieurs constituants différents dont au moins un premier présente intrinsèquement une microtexture lamellaire et dont au moins un deuxième est apte à protéger le premier contre l'oxydation. Plusieurs couches élémentaires d'un premier constituant à microtexture lamellaire choisi par exemple parmi le pyrocarbone, le nitrure de bore et le BC3 sont formées en alternance avec une ou plusieurs couches élémentaires d'un deuxième constituant ayant une fonction de protection contre l'oxydation choisi par exemple parmi SiC, Si3N4, SiB4, SiB6 ou un codépôt des éléments Si, B, C. Les couches élémentaires d'interphase dont l'épaisseur est de préférence inférieure à 10 nanomètres, sont formées par dépôt ou infiltration chimique en phase vapeur sous forme pulsée.

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