Method of manufacturing a security element for a security...

B - Operations – Transporting – 41 – M

Patent

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B41M 3/14 (2006.01) B42D 15/00 (2006.01) D21H 21/26 (2006.01) D21H 21/40 (2006.01) D21H 21/44 (2006.01) D21H 21/46 (2006.01) D21H 21/48 (2006.01) B41M 3/00 (2006.01) B44F 1/00 (2006.01) B44F 3/00 (2006.01) B44F 5/00 (2006.01)

Patent

CA 2761781

A translucent area (Z2) is formed in the element (14) by applying a substance (24) that transparentizes its substrate (12). Thus, the method includes a step of applying a substance (20) that impermeabilizes the substrate (12) over a first area (Z1) on a first side (F1) of the substrate, surrounding a second area (Z2) devoid of the impermeabilizing substance (20). The impermeabilizing substance (20) prevents impregnation of the substrate (12) by the transparentizing substance (24) in the first area (Z1). The method then includes a step of applying the transparentizing substance (24) to at least the second area (Z2) so as to impregnate the substrate (12) in order to make it translucent in this area (Z2). The first (Z1) and second (Z2) areas form first (18) and second (22) patterns respectively, making up an image that can be observed from both sides (F1, F2) of the substrate (12).

On forme une zone translucide (Z2) dans l'élément (14) par application d'un produit (24) transparentisant son substrat (12). Ainsi, le procédé comprend une étape d'application d'un produit (20) imperméabilisant le substrat (12) sur une première zone (Z1) d'une première face (F1) du substrat entourant une deuxième zone (Z2) dépourvue du produit imperméabilisant (20). Le produit imperméabilisant (20) empêche l'imprégnation du substrat (12) par le produit transparentisant (24) dans la première zone (Z1). Le procédé comprend ensuite une étape d'application du produit transparentisant (24) sur au moins la deuxième zone (Z2) de manière à imprégner le substrat (12) pour le rendre translucide dans cette zone (Z2). Les première (Z1) et deuxième (Z2) zones forment respectivement des premier (18) et deuxième (22) motifs composant une image observable à partir des deux faces (F1, F2) du substrat (12).

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