Method of manufacturing photosensitive material

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

345/27

H01L 31/18 (2006.01) G03C 1/705 (2006.01) H05K 3/10 (2006.01) H05K 3/42 (2006.01) H05K 1/03 (2006.01)

Patent

CA 1041644

ABSTRACT OF THE DISCLOSURE: Manufacture of photosensitive material by a dispersion of particles of semiconducting metal oxide having a charge sign opposite to that of the substrate in the dispersion agent, which dispersion is provided on the substrate surface and adhered thereto. In a similar manner walls of a hole for electrical through-connections are made photosensitive as a pretreatment for metal-plating.

214614

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing photosensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing photosensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing photosensitive material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-487337

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.