Method of manufacturing titanium magnetic disk substrate

Details Method of manufacturing titanium magnetic disk substrate Method of manufacturing titanium magnetic disk substrate

C - Chemistry, Metallurgy

23

C

204/96.1

C23C 14/34 (2006.01) G11B 5/73 (2006.01) G11B 5/84 (2006.01) G11B 5/85 (2006.01)

Patent

CA 2037621

Abstract of the Disclosure After the surface roughness of a titanium substrate is set to be RmaX ? 0.08 µm, a hardened layer having a hardness of Hv ? 250 is formed thereon to have a thickness of 50 to 250 µm by sputtering, thereby manufacturing a titanium magnetic disk substrate.

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