Method of measuring copper ion concentration in industrial...

G - Physics – 01 – N

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G01N 27/48 (2006.01) G01N 27/49 (2006.01)

Patent

CA 2421181

The method consists in registering curves by cyclic voltammetry method in the range of copper ion concentration up to 20 g/l or alternately by chronoamperometric method in the range of concentration from 20 to 60 g/l. A platinum or gold microprobe of a diameter in the range from 1 to 50 um and a copper plate reference electrode are used. The value of current density read off from said curves is compared to the calibration curves previously determined by standard additions method. For high concentration in the range from 20 to 60 g/l, the calibration curves obtained in the range of temperatures from 15 to 60 ~C are registered.

L'invention concerne un procédé consistant à enregistrer des courbes par un procédé de voltampérométrie cyclique dans la plage de concentration d'ions cuivre pouvant atteindre 20 g/l, ou dans une autre forme de réalisation par un procédé de chrono-ampérométrie dans la plage de concentration comprise entre 20 et 60 g/l. Une microsonde platine ou or de diamètre compris entre 1 et 50 µm et une électrode de référence sous forme de plaque de cuivre sont utilisées. La valeur de la densité de courant donnée par ces courbes est comparée à des courbes d'étalonnage déterminées au préalable par un procédé d'additions standard. Pour de fortes concentrations comprises dans la plage de 20 à 60 g/l, les courbes d'étalonnage obtenues dans la plage de températures de 15 à 60 ·C sont enregistrées.

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