Method of preparing an alkali metal diffusion preventive layer

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

204/96.31, 148/2

C23C 14/06 (2006.01) C03C 21/00 (2006.01) C03C 23/00 (2006.01) C23C 14/48 (2006.01) H01L 21/265 (2006.01)

Patent

CA 2014758

ABSTRACT OF THE DISCLOSURE The present invention concerns a method of preparing an alkali metal diffusion-preventive layer by applying one of three specific methods in a method of forming an alkali metal diffusion-preventive layer containing phosphorus at the inside of the substrate containing silicon by ion implantation of phosphorus, thereby enabling to prepare an alkali metal diffusion-preventive layer having higher alkali metal diffusion-preventive performance than that of the alkali metal diffusion-preventive layer prepared by the conventional method.

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