Method of preparing high glass transition temperature...

Details Method of preparing high glass transition temperature... Method of preparing high glass transition temperature...

C - Chemistry, Metallurgy

08

G

96/177, 402/51

C08G 8/24 (2006.01) C08G 8/08 (2006.01) G03F 7/023 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2031564

Abstract of the Disclosure Novolak resins possessing a high glass transition temperature ("Tg") particularly suited for use in high resolution photoresist compositions are provided. The resins are prepared by the condensation reaction of formaldehyde with a multi-substituted phenol, such as for example 3,5-dimethyl phenol, a resorcinol, and optionally another phenol . Novolak resins having Tg's greater than about 120 degrees Centigrade are preferred. These novolaks are preferably prepared by the condensation reaction of formaldehyde with a multi- substituted phenol, 2-methylresorcinol and m-cresol.

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