Method of producing a gradient layer

Details Method of producing a gradient layer Method of producing a gradient layer

C - Chemistry, Metallurgy

23

C

C23C 16/50 (2006.01) C23C 16/02 (2006.01) C23C 16/40 (2006.01) C23C 16/515 (2006.01) C23C 16/52 (2006.01) G02B 1/10 (2006.01)

Patent

CA 2165598

The invention relates to a plasma CVD method for producing a gradient layer wherein the layer gradient is produced in the direction of layer growth by changing at least one plasma power parameter during the coating process. According to the invention, thin gradient layers are generated with high precision by supplying the plasma power in a pulsed manner and adjusting the layer gradient by changing the plasma power parameters of pulse amplitude, pulse duration and/or pulse interval.

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