G - Physics – 03 – F
Patent
G - Physics
03
F
26/44, 93/83
G03F 1/00 (2006.01) G03F 1/14 (2006.01)
Patent
CA 1300857
72689-2 ABSTRACT OF THE DISCLOSURE The invention concerns a method of producing protective films or the like used as protective covers for photomasks or reticles. To peel a thin film off a substrate, a peeling jig constituted by a flexible annular frame with an adhesive applied thereon is pressed against the thin film applied on the substrate; a portion of the peeling jig is grabbed after the peeling jig and the thin film are adhered together; and the peeling jig and the film are peeled off the substrate. Before adhering the peeled film onto a side end surface of a pellicle frame, of the two edges of the pellicle frame, at least the edge formed by an inside surface thereof and the side end surface thereof is chamfered.
567814
Fujimoto Makoto
Kaya Toshio
Nakagawa Hiroaki
Mitsui Chemicals Incorporated
Smart & Biggar
LandOfFree
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