Method of producing phosphorus-doped silicon monocrystals

C - Chemistry – Metallurgy – 30 – B

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148/3

C30B 31/06 (2006.01) C30B 13/06 (2006.01)

Patent

CA 1085703

ABSTRACT OF THE DISCLOSURE A process is described for the production of phosphorus-doped silicon monocrystals with a peripheral depletion of the dopant directed in the radial direction, in which a silicon monocrystalline rod provided with a homogeneous phosphorus doping is subjected to a zone melting process, for depletion of the dopant in a vacuum and for an enrichment of the dopant in a doping gas atmosphere, the molten zone being annular and having a depth set in accordance with the desired peripheral depletion or enrichment zone to be less than the rod radius.

263236

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method of producing phosphorus-doped silicon monocrystals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing phosphorus-doped silicon monocrystals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing phosphorus-doped silicon monocrystals will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-414922

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.