Method of producing single crystal film

Details Method of producing single crystal film Method of producing single crystal film

C - Chemistry, Metallurgy

30

B

148/3.4

C30B 23/06 (2006.01) C30B 1/02 (2006.01) C30B 1/08 (2006.01)

Patent

CA 1209017

-1- Abstract of the Disclosure The invention provides a method of forming a single crystal film on the surface of an insulating film. The method involves forming an amorphous or polycrystalline film on the exposed surfaces of a single crystal substrate and an insulating film, in an ultra-high vacuum. The product is then heat treated so that the film is subjected to solid phase epitaxial growth at a temperature far lower than in prior-art methods, whereby a single crystal film is formed.

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