Method of reducing impurities in aqueous monomer solutions

Details Method of reducing impurities in aqueous monomer solutions Method of reducing impurities in aqueous monomer solutions

C - Chemistry, Metallurgy

07

C

C07C 57/07 (2006.01) C07B 63/00 (2006.01) C07C 51/487 (2006.01)

Patent

CA 2123388

ABSTRACT OF THE DISCLOSURE A method of reducing the levels of impurities in aqueous monomer solutions is provided. Subjecting aqueous monomer solutions to ultraviolet radiation for fromabout 2 minutes to about 5 hours, reduces the level of impurities, especially carbonyl- compounds.

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