C - Chemistry – Metallurgy – 30 – B
Patent
C - Chemistry, Metallurgy
30
B
C30B 29/60 (2006.01) C30B 5/00 (2006.01) C30B 33/00 (2006.01) G02B 6/12 (2006.01) G02B 6/122 (2006.01)
Patent
CA 2507109
A new type of synthetic silicon colloidal photonic colloidal crystal is described presenting a different topology than previously synthesised high refractive index contrast colloidal photonic crystals. It has been built using a new synthesis process based upon micromolding in inverse silica opals (MISO), where the micromold has a structure of interconnected air cavities in a silica matrix. By chemical vapour deposition of disilane within this micromold, a continuous and uniform silicon layer of controlled thickness is formed, which coats the walls of the silica matrix. Later, by dissolution of the starting silica micromold it is possible to oA new type of synthetic silicon colloidal photonic colloidal crystal is described presenting a different topology than previously synthesised high refractive index contrast colloidal photonic crystals. It has been built using a new synthesis process based upon micromolding in inverse silica opals (MISO), where the micromold has a structure of interconnected air cavities in a silica matrix. By chemical vapour deposition of disilane within this micromold, a continuous and uniform silicon layer of controlled thickness is formed, which coats the walls of the silica matrix. Later, by dissolution of the starting silica micromold it is possible to obtain a face centered cubic silicon colloidal photonic crystal with a topology never observed before and which presents a full photonic band gap, as indicated by theoretical photonic band structure calculations making them useful as optical components of envisioned all-optical microphotonic crystal devices, circuits, chips and computers.
L'invention se rapporte à un nouveau type de cristal colloïdal photonique de silicium, synthétique, qui présente une topologie différente de celle des cristaux colloïdaux photoniques de contraste à indice de réfraction élevé précédemment synthétisés. Le nouveau cristal est élaboré au moyen d'un nouveau processus de synthèse basé sur un micromoulage en opales de silice inverse (MISO), dans lequel le micromoule possède une structure de cavités à air interconnectées dans une matrice de silice. Par dépôt chimique en phase vapeur de disilane à l'intérieur de ce micromoule, il est possible de former une couche de silicium continue et uniforme d'une épaisseur régulée qui recouvre les parois de la matrice de silice. Ensuite, par dissolution du micromoule de silice de départ, il est possible d'obtenir un cristal colloïdal photonique de silicium cubique à faces centrées présentant une topologie jusqu'à présent inconnue et qui possède une bande interdite entièrement photonique, ainsi que le montrent les calculs de structure de bande photonique théoriques, ce qui les rend utiles en tant que composants optiques de dispositifs, circuits, puces et ordinateurs à cristaux microphotoniques tout-optique.
Miguez Hernan
Ozin Geoffrey Alan
Tetreault Nicolas
Yang San Ming
Hill & Schumacher
The Governing Council Of The University Of Toronto
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