Method of synthesizing carbon film and carbon particles in a...

Details Method of synthesizing carbon film and carbon particles in a... Method of synthesizing carbon film and carbon particles in a...

C - Chemistry, Metallurgy

01

G

23/304, 204/96.3

C01G 31/02 (2006.01)

Patent

CA 1244629

11 ABSTRACT A vapor phase synthesis of carbon film and carbon par- ticles using a single or a mixed gas capable of supplying halogen, hydrogen and carbon atoms is disclosed. Halogen radicals can suppress the desorption of carbon atoms from the substrate, and the carbon layer is obtained easily. especially chroline and fluorine atoms are effective. An electron beam diffraction pattern illustrated that diamond film can be obtained in this method.

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