Method of synthetic diamond ablation with an oxygen plasma...

C - Chemistry – Metallurgy – 30 – B

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C30B 33/12 (2006.01) C04B 41/00 (2006.01) C04B 41/53 (2006.01) C04B 41/80 (2006.01) C04B 41/91 (2006.01) C30B 33/00 (2006.01) H01L 21/3065 (2006.01)

Patent

CA 2175787

A method for ablating a synthetic diamond having a pitted surface includes applying a colloidal graphite to the surface of the diamond and subjecting it to an oxygen plasma so that preferably approximately 50 microns are removed from the surface of the synthetic diamond. The resulting surface of the diamond is virtually pit free. Preferably, the diamond is then mechanically lapped for finishing.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method of synthetic diamond ablation with an oxygen plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of synthetic diamond ablation with an oxygen plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of synthetic diamond ablation with an oxygen plasma... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1707168

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.