H - Electricity – 05 – H
Patent
H - Electricity
05
H
204/181, 358/26,
H05H 1/34 (2006.01) B01J 19/08 (2006.01) C23C 16/513 (2006.01) H05H 1/32 (2006.01) H05H 1/42 (2006.01)
Patent
CA 1324979
ABSTRACT A method of treating substrate surfaces with the aid of a plasma is described. The substrate is supported in a treatment- chamber to which a plasma is passed via a plasma-inlet from a plasma-generator. A reactant is introduced into the plasma- generator and the pressure of the treatment-chamber is maintained lower than that of the plasma-generator. A flushing gas is passed into the plasma-generator upstream of the cathode in the generator and the reactant is fed downstream of the cathode after the flushing gas has passed the cathode. The flushing gas prevents contamination of the plasma by the cathode.
569491
Kroesen Gerardus Maria Wilhelmus
Schram Daniel Cornelis
Fetherstonhaugh & Co.
Technische Universiteit Eindhoven
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