Method of tuning apparatus by low power laser beam removal

H - Electricity – 01 – P

Patent

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H01P 3/08 (2006.01) H01L 21/268 (2006.01) H01L 27/01 (2006.01) H01P 1/205 (2006.01) H01P 11/00 (2006.01) H05K 1/00 (2006.01) H05K 1/03 (2006.01) H05K 3/02 (2006.01) H05K 3/38 (2006.01)

Patent

CA 1145858

ABSTRACT A method of tuning an apparatus for use in communications equipment which comprises providing a non-conductive wafer; providing on a first major surface of the wafer at least one conductive circuit element; providing on the second major surface of the substrate a relatively large conductive area having generally a first predetermined thickness and having, opposite the at least one circuit element, a portion of a second predetermined thickness, the second predetermined thickness being substantially thinner than the first predetermined thickness; and evaporating appropriate portions of the thinner portion of the large conductive area by means of a low-power laser beam having sufficient energy to evaporate the thinner portions of the conductive areas on the second major surface and insufficient energy to evaporate the thicker portions; thereby altering the capacitance between the conductive elements on the opposing sides of said wafer.

360829

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