Methods and apparatus for embossing a precision optical...

B - Operations – Transporting – 29 – D

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B29D 11/00 (2006.01) B29C 59/02 (2006.01) B29C 59/04 (2006.01) G02B 5/124 (2006.01)

Patent

CA 1241514

ABSTRACT OF THE DISCLOSURE Disclosed herein are an improved method and apparatus for continuously embossing a repeating pattern of precise detail, in particular, cube-corner type reflector elements, on one surface of a single sheet or on one surface of a laminate of transparent thermoplastic materials, to form retroreflective sheeting. A con- tinuous embossing tool in the form of a flexible thin metal belt or cylinder has on its outer surface an embossing pattern which is the reverse of the precision optical pattern to be formed. The embossing tool is continuously moved at a predetermined speed along a closet course through a heating station where the temperature of a portion of the embossing tool is raised to be above the glass transition temperature of the sheeting or laminate and a cooling station where the heated portion of the embossing tool is cooled while in a relatively planar condition to be below that glass transi- tion temperature. The sheeting is continuously moved at the predeter- mined speed from a supply thereof into engagement with the embossing pattern on the tool and is pressed there-against continuously at a plurality of pressure points sequentially spaced along the heating station, with the one surface of the sheeting confronting and engaging the embossing pattern until the sheeting is raised above its glass transition temperature and conforms to the embossing pattern on the one face. The sheeting is maintained in engagement with the tool until the tool passes through the cooling station and the sheet- ing is lowered below its glass transition temperature and the pattern solidifies. The sheeting thereafter is stripped from the tool and 2. next passed through a reheating station where the embossed sheeting is heated to an annealing temperature where the stresses formed in the thermoplastic material during embossing and cooling are relieved, while preserving and enhancing the precision optical pattern previously formed.

486421

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