Methods and apparatus for improving an rf excited reactive...

Details Methods and apparatus for improving an rf excited reactive... Methods and apparatus for improving an rf excited reactive...

H - Electricity

05

B

327/29

H05B 7/02 (2006.01) H01J 37/32 (2006.01) H05H 1/48 (2006.01)

Patent

CA 1157914

KUYEL, B. 2 METHODS AND APPARATUS FOR IMPROVING AN RF EXCITED REACTIVE GAS PLASMA Abstract of the Disclosure The quality of a plasma etching process is improved by applying a DC potential to one of the energizing electrodes in the reaction chamber. The DC potential withdraws a small current from the plasma which causes the reaction to produce a uniform, controllable self-bias on the workpiece placed on the opposite (or second) electrode.

366499

Affiliated with

Also associated with

Rating

Methods and apparatus for improving an rf excited reactive... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods and apparatus for improving an rf excited reactive..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods and apparatus for improving an rf excited reactive... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-970719