Methods and apparatuses for depositing nanometric...

B - Operations – Transporting – 82 – B

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B82B 1/00 (2006.01) B82B 3/00 (2006.01)

Patent

CA 2600887

The invention relates to a method for depositing nanometric filamentary structures. The method comprises passing a gaseous phase comprising the nanometric filamentary structures through a space defined between at least two electrodes generating an electric field, for depositing the nanometric filamentary structures on at least one of the electrodes; and at least substantially preventing the deposited nanometric filamentary structures from bridging the electrodes during the deposition. The invention also relates to an apparatus for depositing nanometric filamentary structures as well as to methods and apparatuses for monitoring the production of nanometric filamentary structures and to macroscopic assemblies of nanometric filamentary structures.

La présente invention concerne un procédé pour déposer des structures filamentaires nanométriques. Le procédé comprend faire passer une phase gazeuse comprenant les structures filamentaires nanométriques à travers un espace défini entre au moins deux électrodes générant un champ électrique, pour déposer lesdites structures sur au moins une des électrodes ; et empêcher au moins sensiblement que lesdites structures déposées pontent les électrodes lors du dépôt. L~invention concerne également un appareil destiné à déposer des structures filamentaires nanométriques ainsi que des procédés et des appareils destinés à surveiller la production desdites structures et des ensembles macroscopiques desdites structures.

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